METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUS FOR VACUUM PROCESSING OF A SUBSTRATE

A method for vacuum processing of a substrate is described. The method includes coating the substrate or a first material layer on the substrate with a material using a pulsed laser deposition source provided in a processing region; and moving the substrate through the processing region along a tran...

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Bibliographische Detailangaben
Hauptverfasser:	HELLMICH, Anke, ORGEICH, Gerd
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for vacuum processing of a substrate is described. The method includes coating the substrate or a first material layer on the substrate with a material using a pulsed laser deposition source provided in a processing region; and moving the substrate through the processing region along a transportation path. L'invention concerne un procédé de traitement sous vide d'un substrat. Le procédé comprend le revêtement du substrat ou d'une première couche de matériau sur le substrat avec un matériau à l'aide d'une source de dépôt laser pulsé disposée dans une région de traitement; et le déplacement du substrat à travers la région de traitement le long d'un trajet de transport.