SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

The present invention simplifies the formation of an isolation region of a semiconductor substrate having an increased film thickness. This semiconductor device is provided with: an element region, a wiring region, an external connection unit, a front surface side isolation region, and a rear surfac...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KUDOU Tomoaki, KAWABATA Kazuya, CHIBA Yohei
Format: Patent
Sprache:eng ; fre ; jpn
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