PROCESS FOR MODIFICATION OF A SOLID SURFACE

The invention relates to a process for the modification of a surface of a solid material, comprising the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wher...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZUILHOF, Johannes Teunis, SCHUTZ-TRILLING, Anke Kristin, RIJO DA COSTA CARVALHO, Rui Pedro, KNOBEN, Wout, SCHERES, Luc Maria Wilhelmus, VAN DER MEER, Adriaan Martin Hubert Henri
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES FILLING PASTES GENERAL PROCESSES OF COMPOUNDING GLASS INKS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP
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Beschreibung
Zusammenfassung:	The invention relates to a process for the modification of a surface of a solid material, comprising the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C-OH, Si-OH, C=O and C-O-C groups and wherein the surface-modifying composition comprises at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) comprises at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol%, and wherein the vol% is determined at 20 °C relative to the total of the surface modifying composition. The invention further relates to a solid material having a partial surface modification layer. L'invention concerne un procédé pour la modification d'une surface d'un matériau solide, comprenant l'étape consistant à mettre en contact la surface avec une composition de modification de surface sous exposition à de la lumière ayant une longueur d'onde dans la plage de 200 à 800 nm, éventuellement en présence d'un photoinitiateur, le matériau solide ayant des groupes de surface choisis parmi les groupes C-OH, Si-OH, C=O et C-O-C et la composition de modification de surface comprenant au moins un hydrosilane et au moins un composé réactif (A) autre que l'hydrosilane, le composé réactif (A) comprenant au moins deux groupes fonctionnels choisis parmi les groupes (méth)acrylate, (méth)acrylamide, hydroxyle, acide carboxylique, alcène, alcyne et époxy et la quantité d'hydrosilane dans la composition étant comprise entre 0,5 et 99 % en volume, le pourcentage en volume étant déterminé à 20°C par rapport au total de la composition de modification de surface. L'invention concerne en outre un matériau solide portant une couche de modification de surface partielle.