SUBSTRATE TREATMENT APPARATUS
The present invention relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode part; a generation hole formed to extend through the first electr...
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| creator | LEE, Sang Du OH, Woong Kyo YOO, Kwang Su KOO, Hyun Ho CHO, Kyu Jung |
| description | The present invention relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode part; a generation hole formed to extend through the first electrode part; and a protruding electrode coupled to the second electrode part while protruding downward from the second electrode part at a position corresponding to the generation hole, wherein the protruding electrode is formed to have a shorter length than the first electrode part in the vertical direction.
La présente invention concerne un appareil de traitement de substrat comprenant : une partie de support pour supporter un substrat; une première partie d'électrode disposée au-dessus de la partie de support; une seconde partie d'électrode disposée au-dessus de la première partie d'électrode; un trou de génération formé pour s'étendre à travers la première partie d'électrode; et une électrode en saillie couplée à la seconde partie d'électrode tout en faisant saillie vers le bas à partir de la seconde partie d'électrode à une position correspondant au trou de génération, l'électrode en saillie étant formée de manière à présenter une longueur plus courte que la première partie d'électrode dans la direction verticale.
본 발명은 기판을 지지하기 위한 지지부; 상기 지지부의 상측에 배치된 제1전극부; 상기 제1전극부의 상측에 배치된 제2전극부; 상기 제1전극부를 관통하도록 형성된 생성공; 및 상기 생성공에 대응되는 위치에서 상기 제2전극부로부터 하방으로 돌출되도록 상기 제2전극부에 결합된 돌출전극을 포함하되, 상기 돌출전극이 상하방향을 기준으로 상기 제1전극부에 비해 더 짧은 길이로 형성된 기판처리장치에 관한 것이다. |
| format | Patent |
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La présente invention concerne un appareil de traitement de substrat comprenant : une partie de support pour supporter un substrat; une première partie d'électrode disposée au-dessus de la partie de support; une seconde partie d'électrode disposée au-dessus de la première partie d'électrode; un trou de génération formé pour s'étendre à travers la première partie d'électrode; et une électrode en saillie couplée à la seconde partie d'électrode tout en faisant saillie vers le bas à partir de la seconde partie d'électrode à une position correspondant au trou de génération, l'électrode en saillie étant formée de manière à présenter une longueur plus courte que la première partie d'électrode dans la direction verticale.
본 발명은 기판을 지지하기 위한 지지부; 상기 지지부의 상측에 배치된 제1전극부; 상기 제1전극부의 상측에 배치된 제2전극부; 상기 제1전극부를 관통하도록 형성된 생성공; 및 상기 생성공에 대응되는 위치에서 상기 제2전극부로부터 하방으로 돌출되도록 상기 제2전극부에 결합된 돌출전극을 포함하되, 상기 돌출전극이 상하방향을 기준으로 상기 제1전극부에 비해 더 짧은 길이로 형성된 기판처리장치에 관한 것이다.</description><language>eng ; fre ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190801&DB=EPODOC&CC=WO&NR=2019147097A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,782,887,25573,76557</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190801&DB=EPODOC&CC=WO&NR=2019147097A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE, Sang Du</creatorcontrib><creatorcontrib>OH, Woong Kyo</creatorcontrib><creatorcontrib>YOO, Kwang Su</creatorcontrib><creatorcontrib>KOO, Hyun Ho</creatorcontrib><creatorcontrib>CHO, Kyu Jung</creatorcontrib><title>SUBSTRATE TREATMENT APPARATUS</title><description>The present invention relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode part; a generation hole formed to extend through the first electrode part; and a protruding electrode coupled to the second electrode part while protruding downward from the second electrode part at a position corresponding to the generation hole, wherein the protruding electrode is formed to have a shorter length than the first electrode part in the vertical direction.
La présente invention concerne un appareil de traitement de substrat comprenant : une partie de support pour supporter un substrat; une première partie d'électrode disposée au-dessus de la partie de support; une seconde partie d'électrode disposée au-dessus de la première partie d'électrode; un trou de génération formé pour s'étendre à travers la première partie d'électrode; et une électrode en saillie couplée à la seconde partie d'électrode tout en faisant saillie vers le bas à partir de la seconde partie d'électrode à une position correspondant au trou de génération, l'électrode en saillie étant formée de manière à présenter une longueur plus courte que la première partie d'électrode dans la direction verticale.
본 발명은 기판을 지지하기 위한 지지부; 상기 지지부의 상측에 배치된 제1전극부; 상기 제1전극부의 상측에 배치된 제2전극부; 상기 제1전극부를 관통하도록 형성된 생성공; 및 상기 생성공에 대응되는 위치에서 상기 제2전극부로부터 하방으로 돌출되도록 상기 제2전극부에 결합된 돌출전극을 포함하되, 상기 돌출전극이 상하방향을 기준으로 상기 제1전극부에 비해 더 짧은 길이로 형성된 기판처리장치에 관한 것이다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJANDnUKDglyDHFVCAlydQzxdfULUXAMCHAECoUG8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-HB_IwNDS0MTcwNLc0dDY-JUAQA9MyJm</recordid><startdate>20190801</startdate><enddate>20190801</enddate><creator>LEE, Sang Du</creator><creator>OH, Woong Kyo</creator><creator>YOO, Kwang Su</creator><creator>KOO, Hyun Ho</creator><creator>CHO, Kyu Jung</creator><scope>EVB</scope></search><sort><creationdate>20190801</creationdate><title>SUBSTRATE TREATMENT APPARATUS</title><author>LEE, Sang Du ; OH, Woong Kyo ; YOO, Kwang Su ; KOO, Hyun Ho ; CHO, Kyu Jung</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2019147097A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; kor</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE, Sang Du</creatorcontrib><creatorcontrib>OH, Woong Kyo</creatorcontrib><creatorcontrib>YOO, Kwang Su</creatorcontrib><creatorcontrib>KOO, Hyun Ho</creatorcontrib><creatorcontrib>CHO, Kyu Jung</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE, Sang Du</au><au>OH, Woong Kyo</au><au>YOO, Kwang Su</au><au>KOO, Hyun Ho</au><au>CHO, Kyu Jung</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE TREATMENT APPARATUS</title><date>2019-08-01</date><risdate>2019</risdate><abstract>The present invention relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode part; a generation hole formed to extend through the first electrode part; and a protruding electrode coupled to the second electrode part while protruding downward from the second electrode part at a position corresponding to the generation hole, wherein the protruding electrode is formed to have a shorter length than the first electrode part in the vertical direction.
La présente invention concerne un appareil de traitement de substrat comprenant : une partie de support pour supporter un substrat; une première partie d'électrode disposée au-dessus de la partie de support; une seconde partie d'électrode disposée au-dessus de la première partie d'électrode; un trou de génération formé pour s'étendre à travers la première partie d'électrode; et une électrode en saillie couplée à la seconde partie d'électrode tout en faisant saillie vers le bas à partir de la seconde partie d'électrode à une position correspondant au trou de génération, l'électrode en saillie étant formée de manière à présenter une longueur plus courte que la première partie d'électrode dans la direction verticale.
본 발명은 기판을 지지하기 위한 지지부; 상기 지지부의 상측에 배치된 제1전극부; 상기 제1전극부의 상측에 배치된 제2전극부; 상기 제1전극부를 관통하도록 형성된 생성공; 및 상기 생성공에 대응되는 위치에서 상기 제2전극부로부터 하방으로 돌출되도록 상기 제2전극부에 결합된 돌출전극을 포함하되, 상기 돌출전극이 상하방향을 기준으로 상기 제1전극부에 비해 더 짧은 길이로 형성된 기판처리장치에 관한 것이다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | SUBSTRATE TREATMENT APPARATUS |
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