METHOD OF ADAPTING FEED-FORWARD PARAMETERS

Disclosed herein is a method for correcting values of one or more feed-forward parameters used in a process of patterning substrates, the method comprising: obtaining measured overlay and/or alignment error data of a patterned substrate; calculating one or more correction values for the one or more...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ERDAMAR, Ahmet Koray, YAGUBIZADE, Hadi, CEKLI, Hakki
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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