IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES
A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove...
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| creator | KAWAGUCHI, Mark BLACHUT, Gregory |
| description | A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.
L'invention concerne un procédé de nettoyage d'un substrat comprend l'introduction d'une vapeur dans une chambre de traitement pour faire croître un film polymère sur un substrat dans la chambre de traitement; l'ajout d'une solution au film polymère sur le substrat pour créer un fluide viscoélastique sur le substrat; et l'élimination du fluide viscoélastique pour éliminer les contaminants particulaires du substrat. |
| format | Patent |
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L'invention concerne un procédé de nettoyage d'un substrat comprend l'introduction d'une vapeur dans une chambre de traitement pour faire croître un film polymère sur un substrat dans la chambre de traitement; l'ajout d'une solution au film polymère sur le substrat pour créer un fluide viscoélastique sur le substrat; et l'élimination du fluide viscoélastique pour éliminer les contaminants particulaires du substrat.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwkAQRNNYiPoPC9ZCogimPJM9PLhzj91LRJsQ5KxEA_EL_HKjaG81vDcz4-Rp9iAmVFArTwwlehrQ0B482aNDNif1wUCgid1PCygBz1hULDTQUNdGCkKrJJgCtK1MKe8LeMWDsQiMjmplQTM5kGorgVVAmSajS3vt4-ybk2SuMRS7RezuTey79hxv8dEcaJlmeZptsnWustV_qxd6rj6v</recordid><startdate>20190124</startdate><enddate>20190124</enddate><creator>KAWAGUCHI, Mark</creator><creator>BLACHUT, Gregory</creator><scope>EVB</scope></search><sort><creationdate>20190124</creationdate><title>IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES</title><author>KAWAGUCHI, Mark ; BLACHUT, Gregory</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2019018159A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWAGUCHI, Mark</creatorcontrib><creatorcontrib>BLACHUT, Gregory</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWAGUCHI, Mark</au><au>BLACHUT, Gregory</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES</title><date>2019-01-24</date><risdate>2019</risdate><abstract>A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.
L'invention concerne un procédé de nettoyage d'un substrat comprend l'introduction d'une vapeur dans une chambre de traitement pour faire croître un film polymère sur un substrat dans la chambre de traitement; l'ajout d'une solution au film polymère sur le substrat pour créer un fluide viscoélastique sur le substrat; et l'élimination du fluide viscoélastique pour éliminer les contaminants particulaires du substrat.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES |
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