IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES

IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURSORS TO VISCOELASTIC FLUIDS FOR PARTICLE REMOVAL FROM SUBSTRATES

A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KAWAGUCHI, Mark, BLACHUT, Gregory
Format: Patent
Sprache:eng ; fre
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate. L'invention concerne un procédé de nettoyage d'un substrat comprend l'introduction d'une vapeur dans une chambre de traitement pour faire croître un film polymère sur un substrat dans la chambre de traitement; l'ajout d'une solution au film polymère sur le substrat pour créer un fluide viscoélastique sur le substrat; et l'élimination du fluide viscoélastique pour éliminer les contaminants particulaires du substrat.