TOROIDAL PLASMA CHAMBER

An apparatus and methods for forming a toroidal plasma chamber includes metallic material, material forming process, heat treatment, anodization and a feature to form an ideal gas flow pattern in the plasma chamber. The gas passing through the plasma chamber that functions as a secondary wiring in a...

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Bibliographische Detailangaben
1. Verfasser:	HU, Chaolin
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ALLOYS BASIC ELECTRIC ELEMENTS CASTING CASTING OF METALS CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS CHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS METALLURGY METALLURGY OF IRON MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS PERFORMING OPERATIONS PLASMA TECHNIQUE POWDER METALLURGY PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	An apparatus and methods for forming a toroidal plasma chamber includes metallic material, material forming process, heat treatment, anodization and a feature to form an ideal gas flow pattern in the plasma chamber. The gas passing through the plasma chamber that functions as a secondary wiring in a transformer will be dissociated when coupled with the current induced through a magnetic core by a primary wiring that is a semiconductor switching power source. Cette invention concerne un appareil et des procédés de formation d'une chambre à plasma toroïdale, comprennent un matériau métallique, un procédé de formation de matériau, un traitement thermique, une anodisation et un élément pour former un motif d'écoulement de gaz idéal dans la chambre à plasma. Le gaz traversant la chambre à plasma qui fonctionne comme un câblage secondaire dans un transformateur sera dissocié lors du couplage avec le courant induit à travers un noyau magnétique par un câblage primaire qui est une source d'alimentation à découpage à semi-conducteur.