SYMMETRIC AND IRREGULAR SHAPED PLASMAS USING MODULAR MICROWAVE SOURCES

Embodiments include a plasma processing tool that includes a processing chamber, and a plurality of modular microwave sources coupled to the processing chamber. In an embodiment, the plurality of modular microwave sources include an array of applicators that are positioned over a dielectric body tha...

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Hauptverfasser: CHUA, Thai, KRAUS, Philip, HOUSHMAND, Farzad, AMORMINO, Christian
Format: Patent
Sprache:eng ; fre
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