WAFER ROTATING DEVICE

The present invention relates to a wafer rotating device comprising: a base provided inside a chemical vapor deposition device for forming a thin film on a wafer; a susceptor rotatably provided on an upper part of the base; and a satellite rotatably provided on an upper part of the susceptor and on...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	OH, Chung Seok
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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