A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF
A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower lay...
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| creator | BANINE, Vadim NASALEVICH, Maxim WRICKE, Sandro NIKIPELOV, Andrey STAS, Roland KLUGKIST, Joost |
| description | A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer being greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
La présente invention concerne un appareil lithographique comprenant : un objet, l'objet comprenant : un substrat et éventuellement une couche inférieure située sur le substrat ; une couche supérieure ; et une couche intermédiaire située entre la couche supérieure et le substrat, une force de liaison entre la couche intermédiaire et le substrat ou la couche inférieure étant supérieure à une force de liaison entre la couche intermédiaire et la couche supérieure, et la couche intermédiaire ayant un module de Young et/ou un coefficient de Poisson ayant une valeur comprise dans les 20 % de celui de la couche supérieure. |
| format | Patent |
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La présente invention concerne un appareil lithographique comprenant : un objet, l'objet comprenant : un substrat et éventuellement une couche inférieure située sur le substrat ; une couche supérieure ; et une couche intermédiaire située entre la couche supérieure et le substrat, une force de liaison entre la couche intermédiaire et le substrat ou la couche inférieure étant supérieure à une force de liaison entre la couche intermédiaire et la couche supérieure, et la couche intermédiaire ayant un module de Young et/ou un coefficient de Poisson ayant une valeur comprise dans les 20 % de celui de la couche supérieure.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180628&DB=EPODOC&CC=WO&NR=2018114229A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180628&DB=EPODOC&CC=WO&NR=2018114229A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BANINE, Vadim</creatorcontrib><creatorcontrib>NASALEVICH, Maxim</creatorcontrib><creatorcontrib>WRICKE, Sandro</creatorcontrib><creatorcontrib>NIKIPELOV, Andrey</creatorcontrib><creatorcontrib>STAS, Roland</creatorcontrib><creatorcontrib>KLUGKIST, Joost</creatorcontrib><title>A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF</title><description>A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer being greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
La présente invention concerne un appareil lithographique comprenant : un objet, l'objet comprenant : un substrat et éventuellement une couche inférieure située sur le substrat ; une couche supérieure ; et une couche intermédiaire située entre la couche supérieure et le substrat, une force de liaison entre la couche intermédiaire et le substrat ou la couche inférieure étant supérieure à une force de liaison entre la couche intermédiaire et la couche supérieure, et la couche intermédiaire ayant un module de Young et/ou un coefficient de Poisson ayant une valeur comprise dans les 20 % de celui de la couche supérieure.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwkAQBNA0FqL-w4K14EULLddzkzuJ2eXukmAVgpyNogH9f0zAD7CZYZg3Te4IhQ2Gc4dirAYUQYeh8qD5LM56W-aAJfDhRDpAM9hxViLkoMDLkAbrEdmBc01HcOStD1hqgsAgRMV4c5bNk8mte7zj4tezZJlR0GYV-1cb3313jc_4aRtO12qn1DZN96g2_6kvjpw3OQ</recordid><startdate>20180628</startdate><enddate>20180628</enddate><creator>BANINE, Vadim</creator><creator>NASALEVICH, Maxim</creator><creator>WRICKE, Sandro</creator><creator>NIKIPELOV, Andrey</creator><creator>STAS, Roland</creator><creator>KLUGKIST, Joost</creator><scope>EVB</scope></search><sort><creationdate>20180628</creationdate><title>A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF</title><author>BANINE, Vadim ; NASALEVICH, Maxim ; WRICKE, Sandro ; NIKIPELOV, Andrey ; STAS, Roland ; KLUGKIST, Joost</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2018114229A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>BANINE, Vadim</creatorcontrib><creatorcontrib>NASALEVICH, Maxim</creatorcontrib><creatorcontrib>WRICKE, Sandro</creatorcontrib><creatorcontrib>NIKIPELOV, Andrey</creatorcontrib><creatorcontrib>STAS, Roland</creatorcontrib><creatorcontrib>KLUGKIST, Joost</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BANINE, Vadim</au><au>NASALEVICH, Maxim</au><au>WRICKE, Sandro</au><au>NIKIPELOV, Andrey</au><au>STAS, Roland</au><au>KLUGKIST, Joost</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF</title><date>2018-06-28</date><risdate>2018</risdate><abstract>A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer being greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
La présente invention concerne un appareil lithographique comprenant : un objet, l'objet comprenant : un substrat et éventuellement une couche inférieure située sur le substrat ; une couche supérieure ; et une couche intermédiaire située entre la couche supérieure et le substrat, une force de liaison entre la couche intermédiaire et le substrat ou la couche inférieure étant supérieure à une force de liaison entre la couche intermédiaire et la couche supérieure, et la couche intermédiaire ayant un module de Young et/ou un coefficient de Poisson ayant une valeur comprise dans les 20 % de celui de la couche supérieure.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF |
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