PHOTOINITIATOR AND LIGHT-SHIELDING PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME

The present invention relates to a photoinitiator and a light-shielding photosensitive resin composition containing the same and, more specifically, to: a photoinitiator comprising compounds of two or more groups selected from a group of chemical formula 1, a group of chemical formula 2, and a group...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, Duck Hee, YANG, Young Eun, CHOI, Jung Sik, KIM, Tae Oon, OH, Chun Rim, YOO, Kwon Yil, AHN, Jung Min, KIM, Tae Soo, SEE, Yoon Ki, LEE, Won Jung
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a photoinitiator and a light-shielding photosensitive resin composition containing the same and, more specifically, to: a photoinitiator comprising compounds of two or more groups selected from a group of chemical formula 1, a group of chemical formula 2, and a group of chemical formula 3; and a photosensitive resin composition containing the same so as to exhibit improved light shielding property, and also exhibiting excellent deep curing properties so as to be advantageous in pattern formation and phenomenon processing, which use a photolithographic method, thereby being suitably usable as a light-shielding photosensitive resin composition for an organic light emitting material display panel. La présente invention concerne un photo-initiateur et une composition de résine photosensible de protection contre la lumière le contenant et, plus spécifiquement : un photo-initiateur comprenant des composés d'au moins deux groupes choisis parmi un groupe de la formule chimique 1, un groupe de la formule chimique 2, et un groupe de la formule chimique 3 ; et une composition de résine photosensible contenant celui-ci de manière à présenter une propriété améliorée de protection contre la lumière, et présentant également d'excellentes propriétés de durcissement profond de manière avantageuse pour la formation de motifs et le traitement de phénomènes, qui mettent en œuvre un procédé photo-lithographique, de sorte à pouvoir être utilisée de manière appropriée en tant que composition de résine photosensible de protection contre la lumière pour un écran à matériau électroluminescent organique. 본 발명은 광-개시제 및 이를 포함하는 차광용 감광성 수지 조성물에 관한 것으로, 보다 상세하게는, 화학식 1의 그룹, 화학식 2의 그룹 및 화학식 3의 그룹 중에서 선택되는 2 이상의 그룹의 화합물들을 함유하는 광-개시제, 및 이를 포함하여 향상된 차광성을 나타내고, 또한 우수한 심부 경화성을 나타내어 포토리소그래피법을 사용한 패턴 형성 및 현상 공정에 유리하므로, 유기 발광소재 디스플레이 패널용 차광용 감광성 수지 조성물로서 적합하게 사용될 수 있는 감광성 수지 조성물에 관한 것이다.