COMPOSITION FOR HARD COATING, DECORATION SHEET USING SAME, AND METHOD FOR MANUFACTURING DECORATION SHEET

Provided is a composition for hard coating, the composition comprising: a (meth)acrylic monomer having a C4-C20 cycloalkyl group or a C4-C20 heterocycloalkyl group; and a urethane (meth)acrylic oligomer having a linear or branched alkyl group. La présente invention concerne une composition pour revê...

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Bibliographische Detailangaben
Hauptverfasser:	CHOI, Tae-Yi, SONG, Yea-Ri, PARK, Min-Kyung, KIM, Yu-Jun
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES FILLING PASTES INKS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	Provided is a composition for hard coating, the composition comprising: a (meth)acrylic monomer having a C4-C20 cycloalkyl group or a C4-C20 heterocycloalkyl group; and a urethane (meth)acrylic oligomer having a linear or branched alkyl group. La présente invention concerne une composition pour revêtement dur, la composition comprenant : un monomère (méth)acrylique comprenant un groupe cycloalkyle en C4-C20 ou un groupe hétérocycloalkyle en C4-C20 ; et un oligomère (méth)acrylique d'uréthane comprenant un groupe alkyle linéaire ou ramifié. C4-C20의 시클로 알킬기 또는 C4-C20의 헤테로 시클로 알킬기를 갖는 (메타)아크릴계 모노머; 및 선형 또는 분지형 알킬기를 갖는 우레탄 (메타)아크릴계 올리고머;를 포함하는 하드코팅용 조성물을 제공한다.