METHOD FOR MANUFACTURING ILLUMINANCE ADJUSTMENT FILTER, ILLUMINANCE ADJUSTMENT FILTER, LIGHTING OPTICAL SYSTEM, AND EXPOSURE DEVICE

This method for manufacturing an illuminance adjustment filter comprises steps of: measuring illuminance I(i) at an arbitrary point i (i is an integer) on an exposure surface with no optical filter (90) placed in an optical path EL; calculating the optical transmittance distribution for each cell (9...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KAWASHIMA Hironori
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!