SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTEXTURING, AND SURFACE MICROTEXTURING PLANT AND METHOD

The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) t...

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Bibliographische Detailangaben
Hauptverfasser:	DUBOST, Laurent, JOURLIN, Yves, BICHOTTE, Maxime
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) that is exposed to the outside environment; and a device for creating and depositing droplets (30) on the outer surface (21) of the layer of material (20) in a specific pattern (31) under the effect of condensation such that the optical mask (35) is formed on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a surface microtexturing method. La présente invention concerne un système (2) de réalisation d'un masque optique (35) pour micro-texturation de surface, le système (2) comprenant : un substrat (10) comportant une surface (11) à texturer; une couche de matière (20) recouvrant la surface (11) du substrat (10) et comportant une surface externe (21)exposée à l'environnement extérieur;et un dispositif de génération et dépôt de gouttelettes (30) sur la surface externe(21) de la couche de matière (20),par condensation selon un agencement (31) particulier, formant le masque optique (35)sur la surface externe(21) de la couche de matière (20). L'invention concerne également une installation de traitement comprenant un tel système (2). L'invention concerne également une méthode de réalisation d'un masque et une méthode de micro-texturation de surface.