SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE TREATMENT, AND SURFACE TREATMENT PLANT AND METHOD

The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to the outside environment; and a device for creating and deposit...

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Bibliographische Detailangaben
Hauptverfasser:	DUBOST, Laurent, JOURLIN, Yves, BICHOTTE, Maxime
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to the outside environment; and a device for creating and depositing droplets (30) on the outer surface (21) of the layer of material (20) in a specific pattern (31) such that the optical mask (35) is formed on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a surface treatment method. La présente invention concerne un système (2) de réalisation d'un masque optique (35) pour traitement de surface, notamment pour micro-texturation de surface, le système (2) comprenant : une couche de matière (20) comportant une surface externe (21) exposée à l'environnement extérieur; et un dispositif de génération et dépôt de gouttelettes (30) sur la surface externe (21) de la couche de matière (20), selon un agencement (31) particulier, formant le masque optique (35) sur la surface externe (21) de la couche de matière (20). L'invention concerne également une installation de traitement comprenant un tel système (2). L'invention concerne également une méthode de réalisation d'un masque et une méthode de traitement de surface.