ANTIREFLECTION FILM AND ITS USE ON A SUBSTRATE

The present invention relates to an antireflection film, as well as its use on a substrate (3) to decrease a fracture of light striking the substrate (3) reflected by said substrate (3), wherein said coating is formed of a transparent first layer (1) applied on the substrate (3) and a transparent se...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KABAI, Jánosné, KÓCS, Lenke, MAJOR, Csaba Ferenc, HÓRVÖLGYI, Zoltán, ALBERT, Emöke
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to an antireflection film, as well as its use on a substrate (3) to decrease a fracture of light striking the substrate (3) reflected by said substrate (3), wherein said coating is formed of a transparent first layer (1) applied on the substrate (3) and a transparent second layer (2) on said first layer (1). The essence of the solutions according to the present invention is that thickness (d1) of the first layer (1) ranges from 10 to 70 nm and refractive index (ni) of said first layer (1) satisfies the relation 1.05