PATTERNING DEVICE

A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SCHASFOORT, Gerard, Frans, Jozef, SLADKOV, Maksym, Yuriiovych, DE GROOT, Pieter, BAUMER, Stefan, ENGELEN, Wouter, Joep, VAN ZWOL, Pieter-Jan, BASELMANS, Johannes, Jacobus, Matheus, FINDERS, Jozef, Maria, DE WINTER, Laurentius, Cornelius, DIKKERS, Manfred, Petrus, Johannes, Maria, VOOGD, Robbert Jan, VAN DE KERKHOF, Marcus, Adrianus
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!