APERTURE SIZE MODULATION TO ENHANCE EBEAM PATTERNING RESOLUTION

Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction and having a pitch. Each opening of the first column of openings has a dimension i...

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Hauptverfasser:	TANDON, Shakul, CANZI, Gabriele, PHILLIPS, Mark C
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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