NOVEL MULTILAYER STACKS INCLUDING A STRESS RELIEF LAYER, METHODS AND COMPOSITIONS RELATING THERETO

A multilayer stack is described. The multilayer stack of the present arrangements includes: (i) a polymeric film; (ii) a stress relief layer disposed adjacent to the polymeric film. The stress relief layer includes a matrix and a dispersed phase. The dispersed phase is distributed inside the matrix....

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Bibliographische Detailangaben
1. Verfasser:	GEORGE, Mark, Allen
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A multilayer stack is described. The multilayer stack of the present arrangements includes: (i) a polymeric film; (ii) a stress relief layer disposed adjacent to the polymeric film. The stress relief layer includes a matrix and a dispersed phase. The dispersed phase is distributed inside the matrix. The stress relief layer provides stress-relief properties to the polymeric film during expansion and contraction of the polymeric film resulting from being subjected to high and low temperatures, respectively. L'invention concerne un empilement multicouche. L'empilement multicouche des présents agencements comprend : (i) un film polymère ; (ii) une couche de relâchement de contrainte disposée en position adjacente au film polymère. La couche de relâchement de contrainte comprend une matrice et une phase dispersée. La phase dispersée est distribuée à l'intérieur de la matrice. La couche de relâchement de contrainte confère des propriétés de relâchement de contrainte au film polymère pendant l'expansion et la contraction du film polymère résultant d'une exposition à des températures élevées et basses, respectivement.