METROLOGY METHOD AND LITHOGRAPHIC METHOD, LITHOGRAPHIC CELL AND COMPUTER PROGRAM

Disclosed is a method of measuring a target, associated lithographic method and litho cell. The method comprises measuring said target subsequent to exposure of structures by a lithographic process in a current layer on a substrate over one or more preceding layers, wherein the one or more preceding...

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Bibliographische Detailangaben

1. Verfasser:	BHATTACHARYYA, Kaustuve
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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