ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD

The present invention relates to an organic film composition containing a polymer comprising a structural unit represented by chemical formula 1, a monomer represented by chemical formula 2, and a solvent; and to a pattern forming method using the organic film composition. The definitions of chemica...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, Shinhyo, LEE, Hyunsoo, LEE, Chungheon, JANG, Hyejin, KIM, Taeho, PARK, Youjung, KWON, Hyo Young, PARK, Yushin
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to an organic film composition containing a polymer comprising a structural unit represented by chemical formula 1, a monomer represented by chemical formula 2, and a solvent; and to a pattern forming method using the organic film composition. The definitions of chemical formulas 1 and 2 are as described in the specification. La présente invention concerne une composition de film organique contenant un polymère qui comprend un motif structurel représenté par la formule chimique 1, un monomère représenté par la formule chimique 2, et un solvant ; et un procédé de formation de motif à l'aide de la composition de film organique. Les définitions des formules chimiques 1 et 2 sont telles que décrites dans la description. 화학식 1로 표현되는 구조단위를 포함하는 중합체, 화학식 2로 표현되는 모노머, 그리고 용매를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다.