SPUTTERING TARGET, LAMINATE, MULTI-LAYER BODY, AND METHOD FOR PRODUCING LAMINATE

Provided is a sputtering target with which a film can be formed at a high film-forming rate by reactive sputtering of a Zn-Sn complex oxide film. Furthermore, provided are a laminate and a multi-layer body having the Zn-Sn complex oxide film formed by using such a sputtering target, as well as metho...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAKAWA Naomichi, WATANABE Toshinari, OHKOSHI Kazuto
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	Provided is a sputtering target with which a film can be formed at a high film-forming rate by reactive sputtering of a Zn-Sn complex oxide film. Furthermore, provided are a laminate and a multi-layer body having the Zn-Sn complex oxide film formed by using such a sputtering target, as well as method for producing a laminate. The sputtering target contains 5 to 88 mass% of Zn, 5 to 88 mass% of Sn, and 7 to 90 mass% of Bi, with respect to the total metal content. L'invention concerne une cible de pulvérisation avec laquelle un film peut être formé à une grande vitesse de formation de film par pulvérisation réactive d'un film d'oxyde complexe de Zn-Sn. En outre, l'invention concerne un stratifié et un corps multicouche ayant le film d'oxyde complexe de Zn-Sn formé en utilisant une telle cible de pulvérisation, ainsi qu'un procédé de fabrication d'un stratifié. La cible de pulvérisation contient de 5 à 88 % en masse de Zn, de 5 à 88 % en masse de Sn et de 7 à 90 % en masse de Bi, par rapport à la teneur totale en métal. Ｚｎ－Ｓｎ複合酸化物膜を反応性スパッタリングにより高い成膜速度で成膜できるスパッタリングターゲットを提供する。また、このようなスパッタリングターゲットを用いて成膜されたＺｎ－Ｓｎ複合酸化物膜を有する積層体および複層体、ならびに積層体の製造方法を提供する。スパッタリングターゲットは、全金属量に対して、Ｚｎを５～８８質量％、Ｓｎを５～８８質量％、Ｂｉを７～９０質量％含有する。