SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS

A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and confi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	STALS, Walter, Theodorus, Matheus, VIEYRA SALAS, Jorge, Alberto, POLET, Theodorus, Wilhelmus, VAN LIESHOUT, Josephus, Peter, VAN SOMMEREN, Daan, Daniel, Johannes, Antonius, BALTIS, Coen, Hubertus, Matheus, BUDDENBERG, Harold, Sebastiaan, VAN DE VIJVER, Yuri, Johannes, Gabriël, GATTOBIGIO, Giovanni, Luca, MELMAN, Johannes, Cornelis, Paulus, NAKIBOGLU, Günes, ZDRAVKOV, Aleksandar, Nikolov
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!