METHOD FOR MANAGING MANUFACTURING APPARATUS FOR MANUFACTURING ORGANIC ELECTRONIC DEVICE

The present invention provides a method for managing a manufacturing apparatus that manufactures a high-performance organic electronic device, irrespective of the configuration of the organic electronic device or the manufacturing apparatus. The management method according to one embodiment of the p...

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Bibliographische Detailangaben
Hauptverfasser:	IMANISHI, Katsuya, YUKIWAKI, Satoshi, FUJIMOTO, Hiroshi, SUEKANE, Takashi, YOSHIZAKI, Makoto
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a method for managing a manufacturing apparatus that manufactures a high-performance organic electronic device, irrespective of the configuration of the organic electronic device or the manufacturing apparatus. The management method according to one embodiment of the present invention comprises a positioning step for positioning a substrate (2) inside the manufacturing apparatus (1), and a detection step for detecting impurities attached to the substrate (2), the impurities deriving from the materials of the organic electronic device and/or the manufacturing apparatus. La présente invention concerne un procédé pour la gestion d'un appareil de fabrication qui fabrique un dispositif électronique organique haute performance, quelle que soit la configuration du dispositif électronique organique ou de l'appareil de fabrication. Le procédé de gestion selon un mode de réalisation de la présente invention comprend une étape de positionnement permettant de positionner un substrat (2) dans l'appareil de fabrication (1) et une étape de détection permettant de détecter des impuretés fixées au substrat (2), les impuretés dérivant des matériaux du dispositif électronique organique et/ou de l'appareil de fabrication. 有機エレクトロニクスデバイスまたは製造装置の構成にかかわらず、高性能な有機エレクトロニクスデバイスを製造する製造装置の管理方法を提供する。本発明の一実施形態に係る管理方法は、製造装置（１）内に基材（２）を配置する配置工程と、基材（２）に付着した、有機エレクトロニクスデバイスおよび製造装置の少なくとも一方の材料に由来する不純物を検出する検出工程と、を含む。