SCANNING MEASUREMENT SYSTEM

A method of controlling a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PAARHUIS, Bart, Dinand, ONVLEE, Johannes, BROUWER, Cornelis, Melchior, MOEST, Bearrach, VAN KESSEL, Marcel, Theodorus, Maria, VOOGD, Robbert, Jan
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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