APPARATUS FOR PROCESSING OF A MATERIAL ON A SUBSTRATE, COOLING ARRANGEMENT FOR A PROCESSING APPARATUS, AND METHOD FOR MEASURING PROPERTIES OF A MATERIAL PROCESSED ON A SUBSTRATE

According to one aspect of the present disclosure, an apparatus for processing of a material on a substrate is provided. The apparatus includes a vacuum chamber (110) and a measuring arrangement (160) configured for measuring one or more properties of the substrate (15) and/or of the material proces...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LOTZ, Hans-Georg, HERMANNS, Uwe
Format: Patent
Sprache:eng ; fre
Schlagworte:
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