SCANNING MEASUREMENT SYSTEM

Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DAMME, Jean-Philippe, Xavier, STAS, Roland, Johannes, Wilhelmus, BASELMANS, Johannes, Jacobus, Matheus, MOEST, Bearrach, VOOGD, Robbert Jan
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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