SUBSTRATE HOLDER

The invention relates to microwave technology, and can be used for manufacturing holders for substrates on which films or coatings of different materials, particularly carbon (diamond) films or coatings, are formed by means of a method of plasma vapour-phase chemical deposition. The technical result...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VOLIN, Roman Igorevich, SIZOV, Jurij Evgen'evich, RAL'CHENKO, Viktor Grigor'evich, BELASHOV, Igor' Valer'evich, BOL'SHAKOV, Andrej Petrovich, LJASHHEV, Aleksej Valer'evich
Format:	Patent
Sprache:	eng ; fre ; rus
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!