VACUUM ARC FILM-FORMING APPARATUS AND FILM-FORMING METHOD

A vacuum arc film-forming apparatus for forming a ta-C film on a substrate using arc discharge comprises: a holding unit for holding a target part; an anode part into which electrons discharged from said target part flow; and an electric power source for supplying electric current for generating pla...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAKUSHIJI Hiroshi, WATANABE Yuto, SHIBAMOTO Masahiro, MIURA Yuzuru
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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