RADIO FREQUENCY (RF) - SPUTTER DEPOSITION SOURCE, CONNECTOR FOR RETROFITTING A SPUTTER DEPOSITION SOURCE, APPARATUS AND METHOD OF OPERATING THEREOF

A deposition source for sputter deposition and a method of operating a deposition source for sputter deposition is provided. The deposition source (100) includes a rotatable cathode (110) having a first end (111) and a second end (112). Further, the deposition source includes an RF power supply (120...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HELLMICH, Anke, SCHNAPPENBERGER, Frank
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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