RADIATION SOURCE

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BLEEKER, Arno, Jan, EURLINGS, Markus, Franciscus, Antonius, MUYS, Peter, Frans, Maria, HOFSTRA, Ramon, Mark, OEMRAWSINGH, Sumant, Sukdew, Ramanujan, BUURMAN, Erik, Petrus, MOORS, Johannes, Hubertus, Josephina, VOORMA, Harm-Jan, STRUYCKEN, Alexander, Matthijs
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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