POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENT

Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic. L'invention concerne u...

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Bibliographische Detailangaben
Hauptverfasser:	OTSUKI, SHINGO, HISHIDA, SHOTA, IKEDO, TOMOYA, TAMAI, KAZUSEI, ASANO, HIROSHI, ASAI, MAIKO, ITO, YUUICHI
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic. L'invention concerne une composition de polissage qui est peu coûteuse et capable de conférer un fini de miroir de haute qualité à une céramique. La composition de polissage selon la présente invention contient des grains abrasifs, ayant un pH de 6,0 à 9,0, et est utilisée pour polir une céramique. 　安価であり且つセラミックに対して高品位な鏡面仕上げを行うことができる研磨用組成物を提供する。研磨用組成物は、砥粒を含有し、ｐＨが６．０以上９．０以下であり、セラミックを研磨するために用いられる。