LASER NANOSTRUCTURING AND MICROSTRUCTURING OF SILICON USING A LASER-INDUCED PLASMA FOR THE PROCESSING OF THE PROCESSING LASER BEAM
Laser nanostructuring and microstructuring of silicon using a laser-induced plasma for the processing of the processing laser beam. The method according to the invention is characterised in that it comprises a step of ablation wherein a first, ablation pulsed laser beam is directed, with a fluence i...
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Format: | Patent |
Sprache: | eng ; fre ; spa |
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