APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL

An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. L'in...

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Hauptverfasser: RAJYAGURU, CHIRAG, BAUMGART, PETER, MICHAEL, ALGOTS, JOHN, MARTIN, ISHIKAWA, TETSUYA
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creator RAJYAGURU, CHIRAG
BAUMGART, PETER, MICHAEL
ALGOTS, JOHN, MARTIN
ISHIKAWA, TETSUYA
description An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. L'invention concerne un système de gestion de matériau cible de source de lumière EUV, qui comprend un distributeur de matériau cible et un récipient de matériau cible, où un matériau cible solide dans le récipient de matériau cible est converti en matériau cible sous forme liquide par l'utilisation d'un chauffage inductif.
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subjects GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
title APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL
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