APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL

An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. L'in...

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Bibliographische Detailangaben
Hauptverfasser:	RAJYAGURU, CHIRAG, BAUMGART, PETER, MICHAEL, ALGOTS, JOHN, MARTIN, ISHIKAWA, TETSUYA
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. L'invention concerne un système de gestion de matériau cible de source de lumière EUV, qui comprend un distributeur de matériau cible et un récipient de matériau cible, où un matériau cible solide dans le récipient de matériau cible est converti en matériau cible sous forme liquide par l'utilisation d'un chauffage inductif.