GAS CHROMATOGRAPHY (GC) COLUMN HEATER

An apparatus includes a first column heating apparatus, which includes: a first substrate; a second substrate including silicon; and a first heating element disposed between the first substrate and the second substrate. The apparatus also includes a second column heating apparatus, which includes: a...

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Bibliographische Detailangaben
Hauptverfasser:	TRAUDT, SAMMYE, ELIZABETH, WALSH, GEORGE, P, DRYDEN, PAUL, C, LEOUS, JANE, ANN, WHITE, RICHARD, P, WILSON, WILLIAM, H
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	An apparatus includes a first column heating apparatus, which includes: a first substrate; a second substrate including silicon; and a first heating element disposed between the first substrate and the second substrate. The apparatus also includes a second column heating apparatus, which includes: a third substrate; a fourth substrate including silicon; and a second heating element disposed between the third substrate and the fourth substrate. Un appareil comprend un premier appareil de chauffage de colonne qui comporte : un premier substrat ; un deuxième substrat comportant du silicium ; et un premier élément de chauffage disposé entre le premier substrat et le deuxième substrat. L'appareil comprend également un second appareil de chauffage de colonne qui comporte : un troisième substrat ; un quatrième substrat comportant du silicium ; et un second élément de chauffage disposé entre le troisième substrat et le quatrième substrat.