CONDUCTIVE LAYERED STRUCTURE AND METHODS OF MAKING SAME

A device including a transparent or semitransparent substrate and at least one layered structure disposed on a first major surface of the substrate is described. The layered structure includes a first ITO layer on the substrate, a silicon dioxide layer on the first ITO layer opposite the substrate,...

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Bibliographische Detailangaben
Hauptverfasser: HUMPHRIES, BRET R, SEBASTIAN, MUTHU
Format: Patent
Sprache:eng ; fre
Schlagworte:
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