METHOD AND SYSTEM TO IMPROVE DRYING OF FLEXIBLE NANO-STRUCTURES

Disclosed herein are methods and systems for processing of nano-structures. In particular, disclosed herein are methods for processing nano-structures during semiconductor manufacturing, including nano-structures of drying high-aspect ratios. Also disclosed are systems for implementing the methods d...

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Bibliographische Detailangaben
1. Verfasser:	PRINTZ, WALLACE P
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Disclosed herein are methods and systems for processing of nano-structures. In particular, disclosed herein are methods for processing nano-structures during semiconductor manufacturing, including nano-structures of drying high-aspect ratios. Also disclosed are systems for implementing the methods disclosed herein. L'invention concerne des procédés et des systèmes de traitement de nanostructures. Elle concerne en particulier des procédés de traitement de nanostructures pendant la fabrication de semi-conducteurs, notamment des nanostructures de séchage à rapport d'élongation élevé. L'invention concerne aussi des systèmes de mise en oeuvre desdits procédés.