CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM
A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance...
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| creator | DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS VAN DE WAL, MARINUS, MARIA, JOHANNES VAN EIJK, JAN AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA |
| description | A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
L'invention concerne un système de commande d'un système de positionnement, pour le positionnement d'un objet entraîné, un appareil lithographique par exemple, dans une dimension N. Le système de commande comprend M capteurs, M étant > N. Un module de transformation convertit les M mesures désignées par les capteurs dans une estimation de position en N dimensions, en tenant compte de la conformité de l'objet entraîné. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2015150466A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2015150466A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2015150466A33</originalsourceid><addsrcrecordid>eNqNjE0LgkAURd20iOo_PGhroJnuH-OoA84HM0-jlUhMqyjBdv35ksp1qwv3nnuWwZNpRVbX4E6OuAzBaCdIaCVUOXe1oEqXFk0lGKAxaJEaF8LvK_l7z0PIeSsYB4mqKZBRYyfJZwRU-cwbO9nkOlhc-uvoN99cBduCE6t2frh3fhz6s7_5R3fU-yhO4zQ6ZBkmyX_UC5NTPEI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM</title><source>esp@cenet</source><creator>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS ; VAN DE WAL, MARINUS, MARIA, JOHANNES ; VAN EIJK, JAN ; AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</creator><creatorcontrib>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS ; VAN DE WAL, MARINUS, MARIA, JOHANNES ; VAN EIJK, JAN ; AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</creatorcontrib><description>A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
L'invention concerne un système de commande d'un système de positionnement, pour le positionnement d'un objet entraîné, un appareil lithographique par exemple, dans une dimension N. Le système de commande comprend M capteurs, M étant > N. Un module de transformation convertit les M mesures désignées par les capteurs dans une estimation de position en N dimensions, en tenant compte de la conformité de l'objet entraîné.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151126&DB=EPODOC&CC=WO&NR=2015150466A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151126&DB=EPODOC&CC=WO&NR=2015150466A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS</creatorcontrib><creatorcontrib>VAN DE WAL, MARINUS, MARIA, JOHANNES</creatorcontrib><creatorcontrib>VAN EIJK, JAN</creatorcontrib><creatorcontrib>AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</creatorcontrib><title>CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM</title><description>A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
L'invention concerne un système de commande d'un système de positionnement, pour le positionnement d'un objet entraîné, un appareil lithographique par exemple, dans une dimension N. Le système de commande comprend M capteurs, M étant > N. Un module de transformation convertit les M mesures désignées par les capteurs dans une estimation de position en N dimensions, en tenant compte de la conformité de l'objet entraîné.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjE0LgkAURd20iOo_PGhroJnuH-OoA84HM0-jlUhMqyjBdv35ksp1qwv3nnuWwZNpRVbX4E6OuAzBaCdIaCVUOXe1oEqXFk0lGKAxaJEaF8LvK_l7z0PIeSsYB4mqKZBRYyfJZwRU-cwbO9nkOlhc-uvoN99cBduCE6t2frh3fhz6s7_5R3fU-yhO4zQ6ZBkmyX_UC5NTPEI</recordid><startdate>20151126</startdate><enddate>20151126</enddate><creator>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS</creator><creator>VAN DE WAL, MARINUS, MARIA, JOHANNES</creator><creator>VAN EIJK, JAN</creator><creator>AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</creator><scope>EVB</scope></search><sort><creationdate>20151126</creationdate><title>CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM</title><author>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS ; VAN DE WAL, MARINUS, MARIA, JOHANNES ; VAN EIJK, JAN ; AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2015150466A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS</creatorcontrib><creatorcontrib>VAN DE WAL, MARINUS, MARIA, JOHANNES</creatorcontrib><creatorcontrib>VAN EIJK, JAN</creatorcontrib><creatorcontrib>AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DE BEST, JEROEN, JOHANNES, THEODORUS, HENDRIKUS</au><au>VAN DE WAL, MARINUS, MARIA, JOHANNES</au><au>VAN EIJK, JAN</au><au>AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM</title><date>2015-11-26</date><risdate>2015</risdate><abstract>A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
L'invention concerne un système de commande d'un système de positionnement, pour le positionnement d'un objet entraîné, un appareil lithographique par exemple, dans une dimension N. Le système de commande comprend M capteurs, M étant > N. Un module de transformation convertit les M mesures désignées par les capteurs dans une estimation de position en N dimensions, en tenant compte de la conformité de l'objet entraîné.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM |
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