ELECTROPLATING BATH CONTAINING TRIVALENT CHROMIUM AND PROCESS FOR DEPOSITING CHROMIUM

The present invention refers to an electroplating bath for depositing chromium which comprises at least one trivalent chromium salt, at least one complexing agent, at least one halogen salt and optionally further additives. Moreover, the invention refers to a process for depositing chromium on a sub...

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Bibliographische Detailangaben
Hauptverfasser:	SCHIAVON, GIANLUIGI, DAL ZILIO, DIEGO
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Beschreibung
Zusammenfassung:	The present invention refers to an electroplating bath for depositing chromium which comprises at least one trivalent chromium salt, at least one complexing agent, at least one halogen salt and optionally further additives. Moreover, the invention refers to a process for depositing chromium on a substrate using the mentioned electroplating bath. La présente invention se rapporte à un bain galvanoplastique permettant de déposer du chrome qui comprend au moins un sel de chrome trivalent, au moins un agent complexant, au moins un sel d'halogène et, facultativement, d'autres additifs. En outre, l'invention se rapporte à un procédé permettant de déposer du chrome sur un substrat à l'aide du bain galvanoplastique mentionné.