ETCHING SOURCE INSTALLABLE IN A STORAGE MEDIUM PROCESSING TOOL

A plasma etching source (122) installable into at least one of multiple compartments (102, 104, 106, 108, 110) of a sputter deposition tool (100). The plasma etching source (122) includes a first mounting plate (302) and at least one electrode plate (304) coupled to the first mounting plate (302). A...

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Bibliographische Detailangaben
Hauptverfasser:	GREENBERG, THOMAS, LARSON, TANAKA, SAMUEL, LEWIS
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A plasma etching source (122) installable into at least one of multiple compartments (102, 104, 106, 108, 110) of a sputter deposition tool (100). The plasma etching source (122) includes a first mounting plate (302) and at least one electrode plate (304) coupled to the first mounting plate (302). A gas inlet (308) is included in the first mounting plate (302) of the plasma etching source (122). L'invention concerne une source de gravure par plasma (122) qui peut être installée dans au moins l'un de plusieurs compartiments (102, 104, 106, 108, 110) d'un outil de dépôt par pulvérisation cathodique (100). La source de gravure par plasma (122) comprend une première plaque de montage (302) et au moins une plaque d'électrode (304) couplée à la première plaque de montage (302). Une entrée de gaz (308) est incluse dans la première plaque de montage (302) de la source de gravure par plasma (122).