A COMPOSITION AND A METHOD FOR MANUFACTURING A COMPONENT

Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices. Cette invention concerne des compositions destinées à former des résines résistant à la gravure. Ces résines sont utiles pour fabriquer des composants ou des dispositifs.

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Bibliographische Detailangaben
Hauptverfasser:	AKASAKI, TAIGO, WADA, RISA, OSAKI, TAKESHI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING
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Beschreibung
Zusammenfassung:	Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices. Cette invention concerne des compositions destinées à former des résines résistant à la gravure. Ces résines sont utiles pour fabriquer des composants ou des dispositifs.