METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining a difference between an impact on the parameter for the metrology target design and an impact on the parameter for a prod...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KENT, ERIC, RICHARD, CHEN, GUANGQING, ADAM, OMER, ABUBAKER, OMER, WANG, JEN-SHIANG
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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