INSPECTION METHOD AND APPARATUS, AND LITHOGRAPHIC APPARATUS

Disclosed is a method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method comprises measuring an error in said image characteristic of said substrate; and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DECKERS, DAVID, RHE, KYU, KAB, THEEUWES, THOMAS, SIMONS, HUBERTUS, JOHANNES, GERTRUDUS
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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