MICROCHIP STRUCTURE AND TREATMENTS FOR ELECTROCHEMICAL DETECTION

Disclosed herein are a process for the manufacture of a biosensing device, comprising the steps of providing a substrate having an electrically conductive lead on a surface thereof; applying an insulating layer to the surface and the lead, said insulating layer comprising one or more silicon dioxide...

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Bibliographische Detailangaben
Hauptverfasser:	JACK, GRAHAM, D, HAYMAN, RYAN, B
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ADHESIVES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DYES GLASS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES JOINING GLASS TO GLASS OR OTHER MATERIALS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASURING METALLURGY MINERAL OR SLAG WOOL MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PHYSICS POLISHES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TESTING
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Beschreibung
Zusammenfassung:	Disclosed herein are a process for the manufacture of a biosensing device, comprising the steps of providing a substrate having an electrically conductive lead on a surface thereof; applying an insulating layer to the surface and the lead, said insulating layer comprising one or more silicon dioxide or silicon nitride; etching an aperture in the insulating layer to expose a portion of the lead onto which a nanostructured microelectrode is to be plated; oxidizing one or more of the silicon dioxide or silicon nitride to form oxidized silicon dioxide or silicon nitride; allowing one or more of the oxidized silicon dioxide or silicon nitride to react with a functionalized silane, for use in the electrochemical detection of a target on a sample. La présente invention concerne des procédés et des dispositifs destinés à être utilisés pour la détection électrochimique d'une cible dans un échantillon.