ANNEALING FOR DAMAGE FREE LASER PROCESSING FOR HIGH EFFICIENCY SOLAR CELLS

Annealing solutions providing damage-free laser patterning utilizing auxiliary heating to anneal laser damaged ablation regions are provided herein. Ablation spots on an underlying semiconductor substrate are annealed during or after pulsed laser ablation patterning of overlying transparent passivat...

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Bibliographische Detailangaben
Hauptverfasser:	MOSLEHI, MEHRDAD, M, BENJAMIN, RATTLE, COUTANT, SOLENE, RANA, VIRENDRA, V, KOMMERA, SWAROOP, KAPUR, PAWAN, DESHAZER, HEATHER
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Annealing solutions providing damage-free laser patterning utilizing auxiliary heating to anneal laser damaged ablation regions are provided herein. Ablation spots on an underlying semiconductor substrate are annealed during or after pulsed laser ablation patterning of overlying transparent passivation layers. L'invention concerne des solutions de recuit assurant un modelage laser ne générant pas de dommages utilisant un chauffage auxiliaire pour recuire des régions d'ablation endommagées au laser. Des taches d'ablation sur un substrat de semi-conducteur sous-jacent sont recuites pendant ou après le modelage d'ablation au laser pulsé de couches de passivation transparentes surjacentes.