PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF

The present invention relates to photosensitive compositions containing polynorbomene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered ph...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FUJITA, KAZUYOSHI, SUGIYAMA, HIROMICHI, KNAPP, BRIAN, HORII, MAKOTO, SETO, KEITARO, BURNS, CHERYL, ELCE, EDMUND
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to photosensitive compositions containing polynorbomene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation. La présente invention concerne des compositions photosensibles contenant des polymères de polynorbornène (PNB) et certains additifs qui sont utiles pour la formation de dispositifs micro-électroniques et/ou de dispositifs optoélectroniques et leurs ensembles, et de façon plus spécifique des compositions englobant les PNB et certains phénols à gène stérique comme additifs qui sont résistants à la dégradation de chaîne thermo-oxydante.