ACOUSTICALLY-MONITORED SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEMS AND METHODS

A semiconductor substrate processing system having acoustic monitoring is disclosed. The system includes a process chamber adapted to perform a process on a substrate, a process fluid source, a fluid conduit coupling the fluid source to the process chamber, and a flow control valve located along the...

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Bibliographische Detailangaben
Hauptverfasser:	EGAN, TODD J, YUDOVSKY, JOSEPH, SUBRAHMANYAM, KOMMISETTI, JOHNSON, MICHAEL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING COCKS DEVICES FOR VENTING OR AERATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES TAPS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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Beschreibung
Zusammenfassung:	A semiconductor substrate processing system having acoustic monitoring is disclosed. The system includes a process chamber adapted to perform a process on a substrate, a process fluid source, a fluid conduit coupling the fluid source to the process chamber, and a flow control valve located along the fluid conduit and adapted to be operable to control a flow of a process fluid between the process fluid source and the process chamber. The system includes one or more acoustic sensors operable to sense acoustic noise coupled to at least one of the process fluid source, the fluid conduit, and the flow control valve, and an acoustic processor adapted to receive at least one signal from the one or more acoustic sensors. Acoustic monitoring methods are provided, as are other aspects. L'invention concerne un système de traitement de substrat semi-conducteur ayant un contrôle acoustique. Le système comprend une chambre de traitement pouvant effectuer un traitement sur un substrat, une source de fluide de traitement, un conduit de fluide reliant la source de fluide à la chambre de traitement et une vanne de régulation de flux située le long du conduit de fluide et pouvant être actionnée pour réguler un flux d'un fluide de traitement entre la source de fluide de traitement et la chambre de traitement. Le système comprend un ou plusieurs capteurs acoustiques actionnés pour détecter le bruit acoustique associé à un ou plusieurs éléments parmi la source de fluide de traitement, le conduit de fluide et la vanne de régulation de flux, et un processeur acoustique pouvant recevoir au moins un signal provenant du ou des capteur(s) acoustique(s). L'invention concerne des procédés de contrôle acoustique, ainsi que d'autres aspects.