BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FLEUROV, VLADIMIR, B, FOMENKOV, IGOR, V
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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